Invention Grant
US08748557B2 Extreme low formaldehyde emission UF resin with a novel structure and its preparation
失效
极低甲醛释放UF树脂具有新颖的结构及其制备
- Patent Title: Extreme low formaldehyde emission UF resin with a novel structure and its preparation
- Patent Title (中): 极低甲醛释放UF树脂具有新颖的结构及其制备
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Application No.: US13220386Application Date: 2011-08-29
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Publication No.: US08748557B2Publication Date: 2014-06-10
- Inventor: Xiao-Yu Li , Jun Ye , Hai-Qiao Wang , Teng Qiu
- Applicant: Xiao-Yu Li , Jun Ye , Hai-Qiao Wang , Teng Qiu
- Applicant Address: CN Beijing
- Assignee: Beijing University of Chemical Technology
- Current Assignee: Beijing University of Chemical Technology
- Current Assignee Address: CN Beijing
- Agency: J.C. Patents
- Priority: CN201010503710 20101012
- Main IPC: C08G12/12
- IPC: C08G12/12 ; C08G12/34

Abstract:
The present invention relates to an extreme low formaldehyde emission UF resin with a novel structure, and a process for its preparation. This UF resin is produced from formaldehyde, urea, a long chain multi-aldehyde prepolymer, and some modifiers. Its process follows three steps: weak caustic, weak acid and weak caustic. By using this prepolymer, the modified UF resin has stable alkyl ether structure, and the residual aldehyde groups on the UF polymer chain could accelerate cross-linking instead of dissociative formaldehyde. The UF resin made from this invention has extreme low dissociative formaldehyde and simple technology. The boards produced from this resin have good physical performance and water resistance. Moreover, the formaldehyde emission of the boards is extreme low, achieving Japan F⋆⋆⋆⋆ grade, the average emission value ≦0.3 mg/L.
Public/Granted literature
- US20120088897A1 EXTREME LOW FORMALDEHYDE EMISSION UF RESIN WITH A NOVEL STRUCTURE AND ITS PREPARATION Public/Granted day:2012-04-12
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