Invention Grant
- Patent Title: Charged particle beam drawing apparatus and charged particle beam drawing method
- Patent Title (中): 带电粒子束拉制装置和带电粒子束拉制法
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Application No.: US13568657Application Date: 2012-08-07
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Publication No.: US08748843B2Publication Date: 2014-06-10
- Inventor: Kaoru Tsuruta
- Applicant: Kaoru Tsuruta
- Applicant Address: JP Numazu-shi
- Assignee: NuFlare Technology, Inc.
- Current Assignee: NuFlare Technology, Inc.
- Current Assignee Address: JP Numazu-shi
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2011-174620 20110810
- Main IPC: H01J37/304
- IPC: H01J37/304

Abstract:
A charged particle beam drawing apparatus of an embodiment includes: a drawing unit to perform drawing on a workpiece on a stage by using a charged particle beam; multiple marks located on the stage and having different heights; an irradiation position detector to, when any of the marks is irradiated with the charged particle beam, detect an irradiation position of the charged particle beam on a mark surface of the mark; a drift-amount calculation unit to calculate a drift amount of the charged particle beam on the mark surface by using the irradiation position; a drift-amount processing unit to obtain a drift amount on a workpiece surface by using the drift amounts on at least two of the mark surfaces; and a drawing controller to correct an is irradiation position of the charged particle beam by using the drift amount on the workpiece surface.
Public/Granted literature
- US20130037724A1 CHARGED PARTICLE BEAM DRAWING APPARATUS AND CHARGED PARTICLE BEAM DRAWING METHOD Public/Granted day:2013-02-14
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