Invention Grant
- Patent Title: Methods and structures for electrostatic discharge protection
- Patent Title (中): 静电放电保护的方法和结构
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Application No.: US13555075Application Date: 2012-07-20
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Publication No.: US08748936B2Publication Date: 2014-06-10
- Inventor: Shih-Yu Wang , Chia-Ling Lu , Yan-Yu Chen , Yu-Lien Liu , Tao-Cheng Lu
- Applicant: Shih-Yu Wang , Chia-Ling Lu , Yan-Yu Chen , Yu-Lien Liu , Tao-Cheng Lu
- Applicant Address: TW Hsinchu
- Assignee: Macronix International Co., Ltd.
- Current Assignee: Macronix International Co., Ltd.
- Current Assignee Address: TW Hsinchu
- Agency: Kilpatrick Townsend & Stockton LLP
- Main IPC: H01L29/73
- IPC: H01L29/73

Abstract:
A semiconductor device includes a first well region of a first conductivity type, a second well region of a second conductive type within the first well region. A first region of the first conductivity type and a second region of the second conductivity type are disposed within the second well region. A third region of the first conductivity type and a fourth region of the second conductivity type are disposed within the first well region, wherein the third region and the fourth region are separated by the second well region. The semiconductor device also includes a switch device coupled to the third region.
Public/Granted literature
- US20120286322A1 METHODS AND STRUCTURES FOR ELECTROSTATIC DISCHARGE PROTECTION Public/Granted day:2012-11-15
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