Invention Grant
- Patent Title: Capacitor device and method of fabricating the same
- Patent Title (中): 电容器及其制造方法
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Application No.: US13156371Application Date: 2011-06-09
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Publication No.: US08749022B2Publication Date: 2014-06-10
- Inventor: Dong-Ryul Chang , Hwa-Sook Shin
- Applicant: Dong-Ryul Chang , Hwa-Sook Shin
- Applicant Address: KR Suwon-si, Gyeonggi-do
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-si, Gyeonggi-do
- Agency: Lee & Morse, P.C.
- Priority: KR10-2010-0080407 20100819
- Main IPC: H01L21/02
- IPC: H01L21/02

Abstract:
A capacitor device includes a substrate including a first well having a first conductivity type and a first voltage applied thereto and a second well having a second conductivity type and a second voltage applied thereto; and a gate electrode disposed on an upper portion of the first well or an upper portion of the second well in such a way that the gate electrode is insulated from the first well or the second well, wherein capacitances of the capacitor device include a first capacitance between the first well and the second well and a second capacitance between the first well or the second well and the gate electrode.
Public/Granted literature
- US20120043595A1 CAPACITOR DEVICE AND METHOD OF FABRICATING THE SAME Public/Granted day:2012-02-23
Information query
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