Invention Grant
- Patent Title: Metal ring techniques and configurations
- Patent Title (中): 金属环技术和配置
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Application No.: US13858661Application Date: 2013-04-08
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Publication No.: US08749045B1Publication Date: 2014-06-10
- Inventor: Chender Chen
- Applicant: Marvell International Ltd.
- Applicant Address: BM Hamilton
- Assignee: Marvell International Ltd.
- Current Assignee: Marvell International Ltd.
- Current Assignee Address: BM Hamilton
- Main IPC: H01L23/48
- IPC: H01L23/48 ; H01L21/00

Abstract:
Embodiments of the present disclosure provide an apparatus comprising a substrate layer, a metal ring structure disposed on the substrate layer, the metal ring structure having an opening defined therein, and a solder mask layer coupled to (i) the metal ring structure and (ii) the substrate layer through the opening defined in the metal ring structure, the solder mask layer having a solder mask opening defined therein, wherein an edge of solder mask material defining the solder mask opening overlaps a portion of the opening defined in the metal ring structure. Other embodiments may be described and/or claimed.
Information query
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