Invention Grant
- Patent Title: Display device and manufacturing method thereof
- Patent Title (中): 显示装置及其制造方法
-
Application No.: US13900903Application Date: 2013-05-23
-
Publication No.: US08749061B2Publication Date: 2014-06-10
- Inventor: Shunpei Yamazaki , Mitsuaki Osame
- Applicant: Semiconductor Energy Laboratory Co., Ltd.
- Applicant Address: JP Atsugi-shi, Kanagawa-ken
- Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee Address: JP Atsugi-shi, Kanagawa-ken
- Agency: Robinson Intellectual Property Law Office, P.C.
- Agent Eric J. Robinson
- Priority: JP2002-276295 20020920
- Main IPC: H01L29/76
- IPC: H01L29/76 ; H01L31/036 ; H01L31/112 ; H01L23/48 ; H01L23/52 ; H01L29/40 ; H01L23/532
Abstract:
It is an object of the present invention to prevent an influence of voltage drop due to wiring resistance, trouble in writing of a signal into a pixel, and trouble in gray scales, and provide a display device with higher definition, represented by an EL display device and a liquid crystal display device.In the present invention, a wiring including Cu is provided as an electrode or a wiring used for the display device represented by the EL display device and the liquid crystal display device. Besides, sputtering is performed with a mask to form the wiring including Cu. With such structure, it is possible to reduce the voltage drop and a deadened signal.
Public/Granted literature
- US20130256892A1 DISPLAY DEVICE AND MANUFACTURING METHOD THEREOF Public/Granted day:2013-10-03
Information query
IPC分类:
