Invention Grant
- Patent Title: Liquid ejecting head and liquid ejecting apparatus
- Patent Title (中): 液体喷头和液体喷射装置
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Application No.: US13973483Application Date: 2013-08-22
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Publication No.: US08757777B2Publication Date: 2014-06-24
- Inventor: Akira Matsuzawa , Mutsuhiko Ota , Tetsushi Takahashi , Yasuyuki Matsumoto
- Applicant: Seiko Epson Corporation
- Applicant Address: JP Tokyo
- Assignee: Seiko Epson Corporation
- Current Assignee: Seiko Epson Corporation
- Current Assignee Address: JP Tokyo
- Agency: Workman Nydegger
- Priority: JP2006-248741 20060913
- Main IPC: B41J2/045
- IPC: B41J2/045 ; B41J2/05 ; B41J2/14

Abstract:
A liquid ejecting head that includes a fluid channel formation substrate and pressure generation units. The fluid channel formation substrate is made of a silicon single crystal substrate having a crystal face orientation of. The fluid channel formation substrate has a plurality of separate flow channels that include at least pressure generation chambers demarcated by partition walls, each of the pressure generation chambers being in communication with a nozzle opening that ejects liquid drops. The fluid channel formation substrate further has a communication portion that is in communication with each of the separate flow channels. The pressure generation units are provided so as to correspond to the pressure generation chambers and generate a pressure change in the pressure generation chambers so as to cause ejection of liquid drops.
Public/Granted literature
- US20130335485A1 LIQUID EJECTING HEAD AND LIQUID EJECTING APPARATUS Public/Granted day:2013-12-19
Information query
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