Invention Grant
- Patent Title: Method for pulling a silicon single crystal
- Patent Title (中): 拉硅单晶的方法
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Application No.: US12724590Application Date: 2010-03-16
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Publication No.: US08758506B2Publication Date: 2014-06-24
- Inventor: Markus Baer
- Applicant: Markus Baer
- Applicant Address: DE Munich
- Assignee: Siltronic AG
- Current Assignee: Siltronic AG
- Current Assignee Address: DE Munich
- Agency: Brooks Kushman P.C.
- Priority: DE102009024473 20090610
- Main IPC: C30B15/20
- IPC: C30B15/20

Abstract:
The invention relates to a method for pulling a silicon single crystal from a melt which is contained in a crucible, comprising immersion of a seed crystal into the melt; crystallization of the single crystal on the seed crystal by raising the seed crystal from the melt with a crystal pull speed; widening the diameter of the single crystal to a setpoint diameter in a conical section, comprising control of the crystal pull speed in such a way as to induce a curvature inversion of a growth front of the single crystal in the conical section.
Public/Granted literature
- US20100316551A1 Method For Pulling A Silicon Single Crystal Public/Granted day:2010-12-16
Information query
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