Invention Grant
- Patent Title: Film forming apparatus and vaporizer
- Patent Title (中): 成膜装置和蒸发器
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Application No.: US11660091Application Date: 2005-08-12
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Publication No.: US08758511B2Publication Date: 2014-06-24
- Inventor: Hachishiro Iizuka , Akira Yasumuro , Koichiro Kimura , Norihiko Tsuji
- Applicant: Hachishiro Iizuka , Akira Yasumuro , Koichiro Kimura , Norihiko Tsuji
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2004-235872 20040813; JP2005-022181 20050128
- International Application: PCT/JP2005/014850 WO 20050812
- International Announcement: WO2006/016677 WO 20060216
- Main IPC: C23C16/448
- IPC: C23C16/448 ; C23C16/455 ; C23C16/00 ; C23C16/44 ; C23C16/458

Abstract:
A film forming apparatus including a raw material supplying section for supplying a raw material of a liquid or a gas-liquid mixture, a raw material vaporizing section for vaporizing the raw material to form a raw material gas, and a film forming section for conducting a film forming treatment using the formed raw material gas, and a filter on the transport path for the raw material gas from the raw material vaporizing section to the film forming section. An outer edge of the filter is pressed to the inner surface of the transport path over the whole perimeter thereof by a cyclic supporting member, which is less prone to be deformed by a loading in the pressing direction than the outer edge, and is fixed to the inner surface of the transport path in a compressed state between the inner surface of the transport path and the supporting member.
Public/Granted literature
- US20070266944A1 Film Forming Apparatus and Vaporizer Public/Granted day:2007-11-22
Information query
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