Invention Grant
- Patent Title: Cluster type semiconductor processing apparatus
- Patent Title (中): 集群式半导体处理装置
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Application No.: US11681668Application Date: 2007-03-02
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Publication No.: US08758514B2Publication Date: 2014-06-24
- Inventor: Masahiro Takizawa , Masaei Suwada , Takashi Hagino
- Applicant: Masahiro Takizawa , Masaei Suwada , Takashi Hagino
- Applicant Address: JP Tokyo
- Assignee: ASM Japan K.K.
- Current Assignee: ASM Japan K.K.
- Current Assignee Address: JP Tokyo
- Agency: Knobbe Martens Olson & Bear LLP
- Main IPC: C23C16/00
- IPC: C23C16/00 ; H01L21/00

Abstract:
A cluster type semiconductor processing apparatus includes a wafer handling chamber having a polygonal base including multiple sides for wafer processing chambers and two adjacent sides for wafer loading/unloading chambers as viewed in a direction of an axis of the wafer handling chamber. An angle A between two adjacent sides of the multiple sides for wafer processing chambers is greater than an angle B which is calculated by dividing 360° by the number of the total sides consisting of the multiple sides for wafer processing chambers and the two adjacent sides for wafer loading/unloading chambers.
Public/Granted literature
- US20080210165A1 CLUSTER TYPE SEMICONDUCTOR PROCESSING APPARATUS Public/Granted day:2008-09-04
Information query
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