Invention Grant
- Patent Title: Method for producing a multiplicity of semiconductor wafers by processing a single crystal
- Patent Title (中): 通过处理单晶来生产多个半导体晶片的方法
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Application No.: US13087431Application Date: 2011-04-15
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Publication No.: US08758537B2Publication Date: 2014-06-24
- Inventor: Hans Oelkrug , Josef Schuster
- Applicant: Hans Oelkrug , Josef Schuster
- Applicant Address: DE Munich
- Assignee: Siltronic AG
- Current Assignee: Siltronic AG
- Current Assignee Address: DE Munich
- Agency: Leydig, Voit & Mayer, Ltd.
- Priority: DE102010018570 20100428
- Main IPC: B32B37/00
- IPC: B32B37/00

Abstract:
A method for producing a plurality of semiconductor wafers includes processing a single crystal. The single crystal is provided in a grown state and has a central longitudinal axis with an orientation that deviates from a sought orientation of a crystal lattice of the semiconductor wafers. A block is sliced from the single crystal along cutting planes perpendicular to a crystallographic axis corresponding to the sought orientation of the crystal lattice of the semiconductor wafers. A lateral surface of the block is ground around the crystallographic axis. A plurality of semiconductor wafers are then sliced from the ground block along cutting planes perpendicular to the crystallographic axis.
Public/Granted literature
- US20110265940A1 METHOD FOR PRODUCING A MULTIPLICITY OF SEMICONDUCTOR WAFERS BY PROCESSING A SINGLE CRYSTAL Public/Granted day:2011-11-03
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