Invention Grant
- Patent Title: Electroplating apparatus
- Patent Title (中): 电镀设备
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Application No.: US13651209Application Date: 2012-10-12
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Publication No.: US08758577B2Publication Date: 2014-06-24
- Inventor: Hubert F. Metzger
- Applicant: Chema Technology, Inc.
- Applicant Address: US WI Waukesha
- Assignee: Chema Technology, Inc.
- Current Assignee: Chema Technology, Inc.
- Current Assignee Address: US WI Waukesha
- Agency: Foley & Lardner LLP
- Main IPC: C25D1/04
- IPC: C25D1/04 ; C25D5/04 ; C25D5/48 ; C25D7/04 ; C25D17/02 ; C25D21/14 ; C25D5/20 ; C25D21/18 ; C25D7/00 ; C25D17/06 ; C25D17/00 ; B41C1/18

Abstract:
A system for electroplating a rotogravure cylinder out of a plating solution having a concentration of copper ions wherein the cylinder is connectable to a current source is provided. The system includes a plating apparatus configured to copper plate the cylinder comprising a non-dissolvable anode, a plating tank configured to receive the cylinder, a controller configured to control operation of the apparatus, and a tube for delivering a mixture of a hardener and the plating solution to the plating tank.
Public/Granted literature
- US20130032484A1 ELECTROPLATING APPARATUS Public/Granted day:2013-02-07
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