Invention Grant
US08758634B2 Composition and method for micro etching of copper and copper alloys 有权
铜和铜合金微蚀刻的组成和方法

Composition and method for micro etching of copper and copper alloys
Abstract:
Disclosed is a composition for and applying said method for micro etching of copper or copper alloys during manufacture of printed circuit boards. Said composition comprises a copper salt, a source of halide ions, a buffer system and a benzothiazole compound as an etch refiner. The inventive composition and method is especially useful for manufacture of printed circuit boards having structural features of ≦100 μm.
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