Invention Grant
- Patent Title: Composition and method for micro etching of copper and copper alloys
- Patent Title (中): 铜和铜合金微蚀刻的组成和方法
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Application No.: US13634913Application Date: 2010-05-26
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Publication No.: US08758634B2Publication Date: 2014-06-24
- Inventor: Dirk Tews , Christian Sparing , Martin Thoms
- Applicant: Dirk Tews , Christian Sparing , Martin Thoms
- Applicant Address: DE Berlin
- Assignee: Atotech Deutschland GmbH
- Current Assignee: Atotech Deutschland GmbH
- Current Assignee Address: DE Berlin
- Agency: Renner, Otto, Boisselle & Sklar, LLP
- International Application: PCT/EP2010/057243 WO 20100526
- International Announcement: WO2011/147448 WO 20111201
- Main IPC: H01B13/00
- IPC: H01B13/00

Abstract:
Disclosed is a composition for and applying said method for micro etching of copper or copper alloys during manufacture of printed circuit boards. Said composition comprises a copper salt, a source of halide ions, a buffer system and a benzothiazole compound as an etch refiner. The inventive composition and method is especially useful for manufacture of printed circuit boards having structural features of ≦100 μm.
Public/Granted literature
- US20130056438A1 COMPOSITION AND METHOD FOR MICRO ETCHING OF COPPER AND COPPER ALLOYS Public/Granted day:2013-03-07
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