Invention Grant
- Patent Title: STT-MRAM MTJ manufacturing method with in-situ annealing
- Patent Title (中): STT-MRAM MTJ具有原位退火的制造方法
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Application No.: US13238972Application Date: 2011-09-21
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Publication No.: US08758850B2Publication Date: 2014-06-24
- Inventor: Yuchen Zhou , Yiming Huai
- Applicant: Yuchen Zhou , Yiming Huai
- Applicant Address: US CA Fremont
- Assignee: Avalanche Technology, Inc.
- Current Assignee: Avalanche Technology, Inc.
- Current Assignee Address: US CA Fremont
- Agent Maryam Imam; Bing K Yen
- Main IPC: G11C15/02
- IPC: G11C15/02

Abstract:
A spin transfer torque magnetic random access memory (STTMRAM) element and a method of manufacturing the same is disclosed having a free sub-layer structure with enhanced internal stiffness. A first free sub-layer is deposited, the first free sub-layer being made partially of boron (B), annealing is performed of the STTMRAM element at a first temperature after depositing the first free sub-layer to reduce the B content at an interface between the first free sub-layer and the barrier layer, the annealing causing a second free sub-layer to be formed on top of the first free sub-layer and being made partially of B, the amount of B of the second free sub-layer being greater than the amount of B in the first free sub-layer. Cooling down the STTMRAM element to a second temperature that is lower than the first temperature and depositing a third free sub-layer directly on top of the second free layer, with the third free sub-layer being made partially of boron (B), wherein the amount of B in the third sub-free layer is less than the amount of B in the second free sub-layer.
Public/Granted literature
- US20120295370A1 MAGNETIC RANDOM ACCESS MEMORY (MRAM) WITH ENHANCED MAGNETIC STIFFNESS AND METHOD OF MAKING SAME Public/Granted day:2012-11-22
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