Invention Grant
- Patent Title: Neutral ligand containing precursors and methods for deposition of a metal containing film
- Patent Title (中): 含中性配体的前体和沉积含金属膜的方法
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Application No.: US12212500Application Date: 2008-09-17
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Publication No.: US08758867B2Publication Date: 2014-06-24
- Inventor: Benjamin J. Jurcik, Jr. , Christian Dussarrat
- Applicant: Benjamin J. Jurcik, Jr. , Christian Dussarrat
- Applicant Address: FR Paris
- Assignee: L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés George Claude
- Current Assignee: L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés George Claude
- Current Assignee Address: FR Paris
- Agent Patricia E. McQueeney
- Main IPC: C23C16/513
- IPC: C23C16/513
Abstract:
Methods and compositions for depositing metal films are described herein. In general, the disclosed methods utilize precursor compounds comprising gold, silver or copper. More specifically, the disclosed precursor compounds utilize neutral ligands derived from ethylene or acetylene.
Public/Granted literature
- US20090104375A1 NEUTRAL LIGAND CONTAINING PRECURSORS AND METHODS FOR DEPOSITION OF A METAL CONTAINING FILM Public/Granted day:2009-04-23
Information query
IPC分类:
