Invention Grant
- Patent Title: Conductive reflective film and production method thereof
- Patent Title (中): 导电反射膜及其制造方法
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Application No.: US12596125Application Date: 2008-04-18
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Publication No.: US08758891B2Publication Date: 2014-06-24
- Inventor: Kazuhiko Yamasaki , Yoshiaki Takata , Toshiharu Hayashi
- Applicant: Kazuhiko Yamasaki , Yoshiaki Takata , Toshiharu Hayashi
- Applicant Address: JP Tokyo
- Assignee: Mitsubishi Materials Corporation
- Current Assignee: Mitsubishi Materials Corporation
- Current Assignee Address: JP Tokyo
- Agency: Leason Ellis LLP
- Priority: JP2007-110598 20070419; JP2008-095008 20080401
- International Application: PCT/JP2008/057595 WO 20080418
- International Announcement: WO2008/130031 WO 20081030
- Main IPC: B32B3/26
- IPC: B32B3/26 ; H01L31/0224

Abstract:
A conductive reflective film which is formed by calcining a substrate on which a composition containing metal nanoparticles is coated, the conductive reflective film including pores which appear on the film contact surface in the substrate side having an average diameter of 100 nm or less, an average depth of 100 nm or less in terms of position of the pores, and a number density of the pores of 30 pores/μm2 or less.
Public/Granted literature
- US20100126582A1 CONDUCTIVE REFLECTIVE FILM AND PRODUCTION METHOD THEREOF Public/Granted day:2010-05-27
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