Invention Grant
- Patent Title: Photoresist-free micropatterning on polymer surfaces
- Patent Title (中): 聚合物表面上无光阻的微图案
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Application No.: US10734816Application Date: 2003-12-12
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Publication No.: US08758974B2Publication Date: 2014-06-24
- Inventor: Steven A. Soper , Robin L. McCarley , Bikas Vaidya
- Applicant: Steven A. Soper , Robin L. McCarley , Bikas Vaidya
- Applicant Address: US LA Baton Rouge
- Assignee: Board of Supervisors of Louisiana State University And Agricultural and Mechanical College
- Current Assignee: Board of Supervisors of Louisiana State University And Agricultural and Mechanical College
- Current Assignee Address: US LA Baton Rouge
- Agent John H. Runnels
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F7/038 ; G03F7/20
Abstract:
A method is described for the direct photochemical modification and micro-patterning of polymer surfaces, without the need to use a photoresist. For example, micropatterns of various functional chemical groups, biomolecules, and metal films have been deposited on poly(carbonate) and poly(methyl methacrylate) surfaces. These patterns may be used, for example, in integrated electronics, capture elements, or sensing elements in micro-fluidic channels.
Public/Granted literature
- US20040191703A1 Photoresist-free micropatterning on polymer surfaces Public/Granted day:2004-09-30
Information query
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