Invention Grant
- Patent Title: Photoresist composition
- Patent Title (中): 光刻胶组成
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Application No.: US13505601Application Date: 2010-11-18
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Publication No.: US08758979B2Publication Date: 2014-06-24
- Inventor: Alex Robinson , Richard Palmer , Jon Andrew Preece
- Applicant: Alex Robinson , Richard Palmer , Jon Andrew Preece
- Applicant Address: GB Edgbaston, Birmingham
- Assignee: The University of Birmingham
- Current Assignee: The University of Birmingham
- Current Assignee Address: GB Edgbaston, Birmingham
- Agency: Nixon & Vanderhye, P.C.
- Priority: GB0920231.8 20091118
- International Application: PCT/GB2010/002129 WO 20101118
- International Announcement: WO2011/061501 WO 20110526
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F7/40
Abstract:
Methanofullerene derivatives having side chains with acid-labile protecting groups. The methanofullerene derivatives may find application as photoresist materials, and particularly as positive-tone photoresists.
Public/Granted literature
- US20120251953A1 PHOTORESIST COMPOSITION Public/Granted day:2012-10-04
Information query
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