Invention Grant
- Patent Title: Method of making diode having reflective layer
- Patent Title (中): 制造具有反射层的二极管的方法
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Application No.: US13550097Application Date: 2012-07-16
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Publication No.: US08759129B2Publication Date: 2014-06-24
- Inventor: Myung Cheol Yoo
- Applicant: Myung Cheol Yoo
- Applicant Address: KR Seoul
- Assignee: LG Innotek Co., Ltd
- Current Assignee: LG Innotek Co., Ltd
- Current Assignee Address: KR Seoul
- Agency: Mckenna, Long & Aldridge LLP
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
A method of forming a light emitting diode includes forming a transparent substrate and a GaN buffer layer on the transparent substrate. An n-GaN layer is formed on the buffer layer. An active layer is formed on the n-GaN layer. A p-GaN layer is formed on the active layer. A p-electrode is formed on the p-GaN layer and an n-electrode is formed on the n-GaN layer. A reflective layer is formed on a second side of the transparent substrate. A scribe line is formed on the substrate for separating the diodes on the substrate. Also, a cladding layer of AlGaN is between the p-GaN layer and the active layer.
Public/Granted literature
- US20120322176A1 METHOD OF MAKING DIODE HAVING REFLECTIVE LAYER Public/Granted day:2012-12-20
Information query
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