Invention Grant
- Patent Title: Multi-step and asymmetrically shaped laser beam scribing
- Patent Title (中): 多级和不对称形激光束划线
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Application No.: US13160822Application Date: 2011-06-15
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Publication No.: US08759197B2Publication Date: 2014-06-24
- Inventor: James M. Holden
- Applicant: James M. Holden
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Blakely, Sokoloff, Taylor & Zafman LLP
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
Methods of dicing substrates by both laser scribing and plasma etching. A method includes laser ablating material layers, the ablating leading with a first irradiance and following with a second irradiance, different than the first. An asymmetrically shaped beam having an asymmetrical spatial profile along the direction of travel, multiple passes of a beam adjusted to have different irradiance levels, and multiple laser beams having various irradiance levels may be utilized to ablate at least a mask with the first irradiance and expose the substrate with the second irradiance.
Public/Granted literature
- US20120322232A1 MULTI-STEP AND ASYMMETRICALLY SHAPED LASER BEAM SCRIBING Public/Granted day:2012-12-20
Information query
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