Invention Grant
US08759231B2 Silicon texture formulations with diol additives and methods of using the formulations
失效
具有二醇添加剂的硅纹理配方和使用该配方的方法
- Patent Title: Silicon texture formulations with diol additives and methods of using the formulations
- Patent Title (中): 具有二醇添加剂的硅纹理配方和使用该配方的方法
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Application No.: US13100692Application Date: 2011-05-04
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Publication No.: US08759231B2Publication Date: 2014-06-24
- Inventor: Zhi-Wen Sun , Sagar Vijay
- Applicant: Zhi-Wen Sun , Sagar Vijay
- Applicant Address: US CA San Jose
- Assignee: Intermolecular, Inc.
- Current Assignee: Intermolecular, Inc.
- Current Assignee Address: US CA San Jose
- Main IPC: H01L21/302
- IPC: H01L21/302
Abstract:
The present disclosure includes a texture formulation that includes an aliphatic diol, an alkaline compound and water which provides a consistent textured region across a silicon surface suitable for solar cell applications. Processes for texturing a crystalline silicon substrate using these formulations are also described.
Public/Granted literature
- US20110275222A1 Silicon Texture Formulations With Diol Additives And Methods of Using The Formulations Public/Granted day:2011-11-10
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