Invention Grant
- Patent Title: Method for producing resist copolymer having low molecular weight
- Patent Title (中): 低分子量抗蚀剂共聚物的制造方法
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Application No.: US13675277Application Date: 2012-11-13
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Publication No.: US08759462B2Publication Date: 2014-06-24
- Inventor: Tomo Oikawa
- Applicant: Maruzen Petrochemical Co., Ltd.
- Applicant Address: JP Tokyo
- Assignee: Maruzen Petrochemical Co., Ltd.
- Current Assignee: Maruzen Petrochemical Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Burr & Brown, PLLC
- Priority: JP2011-249049 20111114
- Main IPC: C08F4/04
- IPC: C08F4/04 ; C08F2/04

Abstract:
A method for producing a resist copolymer having a weight-average molecular weight of not less than 3000 and not more than 6000, in which copolymer the contents of an oligomer having a molecular weight of not more than 1000 and a byproduct derived from a polymerization initiator are small, is provided.The method for producing a resist copolymer comprises the step of continuously supplying a solution containing a monomer and a solution containing a polymerization initiator to a heated solvent to carry out a radical polymerization, wherein the variation range of the concentration of the polymerization initiator in polymerization solution is within ±25% of the median value between the maximum concentration and the minimum concentration during specific time; and the variation range of the concentration of unreacted monomer in the polymerization solution is within ±35% of the median value between the maximum concentration and the minimum concentration during specific time.
Public/Granted literature
- US20130123446A1 METHOD FOR PRODUCING RESIST COPOLYMER HAVING LOW MOLECULAR WEIGHT Public/Granted day:2013-05-16
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