Invention Grant
- Patent Title: Low-impurity organosilicon product as precursor for CVD
- Patent Title (中): 低杂质有机硅产品作为CVD的前体
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Application No.: US13668545Application Date: 2012-11-05
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Publication No.: US08759563B2Publication Date: 2014-06-24
- Inventor: Steven Gerard Mayorga , Mark Leonard O'Neill , Kelly A. Chandler
- Applicant: Air Products and Chemicals, Inc.
- Applicant Address: US PA Allentown
- Assignee: Air Products and Chemicals, Inc.
- Current Assignee: Air Products and Chemicals, Inc.
- Current Assignee Address: US PA Allentown
- Agent Rosaleen P. Morris-Oskanian
- Main IPC: C07F7/18
- IPC: C07F7/18 ; C07F7/04
Abstract:
The present invention provides an organosilicon composition comprising diethoxymethylsilane, a concentration of dissolved residual chloride, and a concentration of dissolved residual chloride scavenger that does not yield unwanted chloride salt precipitate when combined with another composition comprising diethoxymethylsilane.
Public/Granted literature
- US20130060061A1 Low-Impurity Organosilicon Product as Precursor for CVD Public/Granted day:2013-03-07
Information query
