Invention Grant
- Patent Title: Titanium black dispersion, photosensitive resin composition, wafer level lens, light blocking film, method for producing the light blocking film, and solid-state image pickup element
- Patent Title (中): 钛黑分散体，感光性树脂组合物，晶片级透镜，遮光膜，遮光膜的制造方法以及固体摄像元件
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Application No.: US13502714Application Date: 2010-10-19
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Publication No.: US08759741B2Publication Date: 2014-06-24
- Inventor: Makoto Kubota
- Applicant: Makoto Kubota
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2009-240546 20091019; JP2010-079581 20100330; JP2010-079779 20100330
- International Application: PCT/JP2010/068393 WO 20101019
- International Announcement: WO2011/049090 WO 20110428
- Main IPC: G03F7/00
- IPC: G03F7/00 ; H01L31/00
Abstract:
A titanium black dispersion includes titanium black particles, a dispersant, and an organic solvent. When the titanium black dispersion is for a wafer level lens, 90% or more of dispersed objects that consist of the titanium black particles have particle diameters of 30 nm or less, or dispersed objects including the titanium black particles contains Si atoms and the content ratio of Si atoms to Ti atoms (Si/Ti) in the dispersed objects is 0.05 or higher. When the titanium black dispersion is used for formation of a light-shielding film that is provided on one side of a silicon substrate having an image pickup device section on the other side, and that shields against infrared light, 90% or more of dispersed objects that consist of the titanium black particles have particle diameters of 30 nm or less.
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