Invention Grant
- Patent Title: Chamber apparatus and extreme ultraviolet light generation system
- Patent Title (中): 室内设备和极紫外光发生系统
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Application No.: US13122354Application Date: 2011-03-11
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Publication No.: US08759804B2Publication Date: 2014-06-24
- Inventor: Toshihiro Nishisaka , Yukio Watanabe , Tamotsu Abe , Osamu Wakabayashi
- Applicant: Toshihiro Nishisaka , Yukio Watanabe , Tamotsu Abe , Osamu Wakabayashi
- Applicant Address: JP Tochigi
- Assignee: Gigaphoton Inc.
- Current Assignee: Gigaphoton Inc.
- Current Assignee Address: JP Tochigi
- Agency: McDermott Will & Emery LLP
- Priority: JP2010-063359 20100318; JP2010-288902 20101224
- International Application: PCT/JP2011/056483 WO 20110311
- International Announcement: WO2011/115233 WO 20110922
- Main IPC: A61N5/06
- IPC: A61N5/06 ; G01J3/10 ; H05G2/00
Abstract:
A chamber apparatus used with an external apparatus having an obscuration region may include: a chamber in which extreme ultraviolet light is generated; a collector mirror provided in the chamber for collecting the extreme ultraviolet light; a support for securing the collector mirror to the chamber; and an output port provided to the chamber for allowing the extreme ultraviolet light collected by the collector mirror to be introduced therethrough into the external apparatus.
Public/Granted literature
- US20110309260A1 CHAMBER APPARATUS AND EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM Public/Granted day:2011-12-22
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