Invention Grant
- Patent Title: Inspection apparatus for lithography
- Patent Title (中): 光刻检验装置
-
Application No.: US12746071Application Date: 2008-12-01
-
Publication No.: US08760623B2Publication Date: 2014-06-24
- Inventor: Johannes Maria Kuiper
- Applicant: Johannes Maria Kuiper
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C
- International Application: PCT/EP2008/010176 WO 20081201
- International Announcement: WO2009/071259 WO 20090611
- Main IPC: G03B27/42
- IPC: G03B27/42
Abstract:
An illuminator configured to create a radiation beam for the metrology of a substrate surface includes an arc lamp, a parabolic reflector (150), a double cone (160) and a fly's eye integrator (110) in order to create a homogenized beam with a parabolic distribution.
Public/Granted literature
- US20100302521A1 Inspection Apparatus for Lithography Public/Granted day:2010-12-02
Information query
