Invention Grant
US08760625B2 Lithographic apparatus, aberration detector and device manufacturing method
有权
光刻设备，像差检测器和器件制造方法
- Patent Title: Lithographic apparatus, aberration detector and device manufacturing method
- Patent Title (中): 光刻设备，像差检测器和器件制造方法
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Application No.: US13169666Application Date: 2011-06-27
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Publication No.: US08760625B2Publication Date: 2014-06-24
- Inventor: Wilhelmus Jacobus Maria Rooijakkers
- Applicant: Wilhelmus Jacobus Maria Rooijakkers
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- Main IPC: G03B27/52
- IPC: G03B27/52 ; G03F7/20 ; G01M11/02
Abstract:
An aberration detector for a lithographic apparatus is used. An imaging device captures an image of at least one pinhole feature of a target projected onto the imaging device by the projection system of the lithographic apparatus at two different locations separated in a direction parallel to the optical axis of the projection system. A controller obtains a representation of the aberration of the projection system from the captured images.
Public/Granted literature
- US20120026477A1 Lithographic Apparatus, Aberration Detector and Device Manufacturing Method Public/Granted day:2012-02-02
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