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US08760629B2 Exposure apparatus including positional measurement system of movable body, exposure method of exposing object including measuring positional information of movable body, and device manufacturing method that includes exposure method of exposing object, including measuring positional information of movable body 有权
包括可移动体的位置测量系统的曝光装置，包括测量可移动体的位置信息的曝光对象的曝光方法以及包括曝光对象的曝光方法的装置制造方法，包括测量移动体的位置信息

  • Patent Title: Exposure apparatus including positional measurement system of movable body, exposure method of exposing object including measuring positional information of movable body, and device manufacturing method that includes exposure method of exposing object, including measuring positional information of movable body
  • Patent Title (中): 包括可移动体的位置测量系统的曝光装置，包括测量可移动体的位置信息的曝光对象的曝光方法以及包括曝光对象的曝光方法的装置制造方法，包括测量移动体的位置信息
  • Application No.: US12640299
    Application Date: 2009-12-17
  • Publication No.: US08760629B2
    Publication Date: 2014-06-24
  • Inventor: Yuichi Shibazaki
  • Applicant: Yuichi Shibazaki
  • Applicant Address: JP Tokyo
  • Assignee: Nikon Corporation
  • Current Assignee: Nikon Corporation
  • Current Assignee Address: JP Tokyo
  • Agency: Oliff PLC
  • Priority: JP2009-122337 20090520
  • Main IPC: G03B27/58
  • IPC: G03B27/58 ;  G03B27/32
Exposure apparatus including positional measurement system of movable body, exposure method of exposing object including measuring positional information of movable body, and device manufacturing method that includes exposure method of exposing object, including measuring positional information of movable body
Abstract:
An exposure apparatus is equipped with a fine movement stage that can hold a liquid with a projection optical system when the stage is at a position facing an outgoing surface of the projection optical system, and a blade that comes into proximity within a predetermined distance of the fine movement stage when the fine movement stage is holding the liquid with the projection optical system, and moves along with the fine movement stage while maintaining the proximity state, and then holds the liquid with the projection optical system after the movement. Accordingly, a plurality of stages will not have to be placed right under the projection optical system interchangeably, which can suppress an increase in footprint of the exposure apparatus.
Abstract(Chinese):

曝光装置配备有微动平台，当舞台位于与投影光学系统的出射表面相对的位置时，能够保持液体的投影光学系统，以及在预定距离内 微动阶段用投影光学系统保持液体的微细运动阶段，并且在保持接近状态的同时与微动载台一起移动，然后在运动之后用投影光学系统保持液体。 因此，可以互换地在投影光学系统的正下方放置多个级，这可以抑制曝光装置的占地面积的增加。

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