Invention Grant
- Patent Title: Substrate inspection apparatus and mask inspection apparatus
- Patent Title (中): 基板检查装置和面罩检查装置
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Application No.: US13293305Application Date: 2011-11-10
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Publication No.: US08760642B2Publication Date: 2014-06-24
- Inventor: Zenta Hori , Haruhiko Kusunose , Koichi Moriizumi
- Applicant: Zenta Hori , Haruhiko Kusunose , Koichi Moriizumi
- Applicant Address: JP Kanagawa
- Assignee: Lasertec Corporation
- Current Assignee: Lasertec Corporation
- Current Assignee Address: JP Kanagawa
- Agency: Carrier Blackman & Associates, P.C.
- Agent Joseph P. Carrier; Michael J. McCandlish
- Priority: JP2011-107723 20110513
- Main IPC: G01N21/88
- IPC: G01N21/88

Abstract:
Substrate inspection apparatus, in which the acquisition of the inspection data for a defect and the acquisition of the focus data of the objective lens are performed in parallel, includes an autofocus apparatus for controlling position of the objective lens along its optical axis. The autofocus apparatus includes a focus error detection unit and a focus control signal generation unit for generating a focus control signal for controlling the position of the objective lens for each scan line using a focus data signal composed of an objective position signal or the objective position signal to which a focus error signal is added. When “i” is assumed as a positive integer and “m” is as a natural number, the focus data signal which was acquired during the scanning period of i-th scan line is used to produce the focus control signal used to scan the (i+2m)-th scan line.
Public/Granted literature
- US20120287424A1 SUBSTRATE INSPECTION APPARATUS AND MASK INSPECTION APPARATUS Public/Granted day:2012-11-15
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