Invention Grant
US08760924B2 Nonvolatile semiconductor memory device and method of data write therein
有权
非易失性半导体存储器件及其中的数据写入方法
- Patent Title: Nonvolatile semiconductor memory device and method of data write therein
- Patent Title (中): 非易失性半导体存储器件及其中的数据写入方法
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Application No.: US13427263Application Date: 2012-03-22
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Publication No.: US08760924B2Publication Date: 2014-06-24
- Inventor: Hitoshi Iwai , Tomoko Fujiwara , Hideaki Aochi , Masaru Kito
- Applicant: Hitoshi Iwai , Tomoko Fujiwara , Hideaki Aochi , Masaru Kito
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2011-158565 20110720
- Main IPC: G11C16/04
- IPC: G11C16/04

Abstract:
A memory cell comprises a first semiconductor layer, and a first conductive layer. The first semiconductor layer extends in a perpendicular direction with respect to a semiconductor substrate. The first conductive layer sandwiches a charge storage layer with the first semiconductor layer. A control circuit executes a first program operation and then executes a second program operation. The first program operation supplies a first voltage to the body of the memory cell and supplies a second voltage larger than the first voltage to the gate of the memory cell. The second program operation renders the body of the memory cell in a floating state and supplies a third voltage which is positive to the gate of the memory cell.
Public/Granted literature
- US20130021848A1 NONVOLATILE SEMICONDUCTOR MEMORY DEVICE AND METHOD OF DATA WRITE THEREIN Public/Granted day:2013-01-24
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