Invention Grant
- Patent Title: Numerical aperture integration for optical critical dimension (OCD) metrology
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Application No.: US13371317Application Date: 2012-02-10
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Publication No.: US08762100B1Publication Date: 2014-06-24
- Inventor: Hanyou Chu , Peilin Jiang , Joerg Bischoff
- Applicant: Hanyou Chu , Peilin Jiang , Joerg Bischoff
- Applicant Address: JP Tokyo US CA Milpitas
- Assignee: Tokyo Electron Limited,KLA-Tencor Corporation
- Current Assignee: Tokyo Electron Limited,KLA-Tencor Corporation
- Current Assignee Address: JP Tokyo US CA Milpitas
- Agency: Blakely Sokoloff Taylor & Zafman LLP
- Main IPC: G01B7/00
- IPC: G01B7/00 ; G01N21/00

Abstract:
Provided are techniques for numerically integrating an intensity distribution function over a numerical aperture in a manner dependent on a determination of whether the numerical aperture spans a Rayleigh singularity. Where a singularity exists, Gaussian quadrature (cubature) is performed using a set of weights and points (nodes) that account for the effect of the Wood anomaly present within the aperture space. The numerical aperture may be divided into subregions separated by curves where the Wood anomaly condition is satisfied. Each subregion is then numerically integrated and a weighted sum of the subregion contributions is the estimate of the integral. Alternatively, generalized Gaussian quadrature (cubature) is performed where an analytical polynomial function which accounts for the effect of the Wood anomaly present within the aperture space is integrated. Points and nodes generated from a fit of the analytical polynomial function are then used for integration of the intensity distribution function.
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