Invention Grant
- Patent Title: Fabrication method of substrate
- Patent Title (中): 基板的制造方法
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Application No.: US13525369Application Date: 2012-06-18
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Publication No.: US08763243B2Publication Date: 2014-07-01
- Inventor: Jing-Yi Yan , Shu-Tang Yeh
- Applicant: Jing-Yi Yan , Shu-Tang Yeh
- Applicant Address: TW Hsinchu
- Assignee: Industrial Technology Research Institute
- Current Assignee: Industrial Technology Research Institute
- Current Assignee Address: TW Hsinchu
- Agency: Jianq Chyun IP Office
- Priority: TW97148842A 20081215
- Main IPC: H01L21/56
- IPC: H01L21/56

Abstract:
A fabricating method of a substrate board is provided. The substrate board includes a substrate having rigid areas and flexible areas, and at least an electronic component disposed on the substrate, wherein each of the rigid areas is thicker than the flexible areas. A patterned high-extensive material may be additionally disposed on the substrate to improve reliability thereof. The rigid areas and the flexible areas may be formed by molds or cutters. By using an above structure, the electronic component is less affected when the substrate is under stress, so that good characteristics are maintained.
Public/Granted literature
- US20120258573A1 FABRICATION METHOD OF SUBSTRATE Public/Granted day:2012-10-11
Information query
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