Invention Grant
- Patent Title: Method and apparatus for transcripting fine patterns
- Patent Title (中): 用于转录精细图案的方法和装置
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Application No.: US13025694Application Date: 2011-02-11
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Publication No.: US08764431B2Publication Date: 2014-07-01
- Inventor: Naoaki Yamashita , Toshimitsu Shiraishi , Koji Tsushima , Masashi Aoki
- Applicant: Naoaki Yamashita , Toshimitsu Shiraishi , Koji Tsushima , Masashi Aoki
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Technologies Corporation
- Current Assignee: Hitachi High-Technologies Corporation
- Current Assignee Address: JP Tokyo
- Agency: Mattingly & Malur, PC
- Priority: JP2010-050631 20100308; JP2010-262320 20101125
- Main IPC: A01J21/00
- IPC: A01J21/00

Abstract:
In a method for transcripting fine patterns and an apparatus for transcripting fine patterns, the ingress of bubbles is prevented and patterns are transcripted with a high throughput by a relatively compact apparatus. For this purpose, a back surface of a stamper is vacuum sucked and the stamper is brought into close contact with a target of transcription with its surfaces coated with resist and pressure is applied thereto. At this time, the stamper is deformed into a spherical shape or bent to expand the close contact face from a central area to a peripheral area to prevent the ingress of air bubbles into between the target of transcription and the stamper.
Public/Granted literature
- US20110217479A1 METHOD AND APPARATUS FOR TRANSCRIPTING FINE PATTERNS Public/Granted day:2011-09-08
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