Invention Grant
- Patent Title: SiOC membranes and methods of making the same
- Patent Title (中): SiOC膜及其制造方法
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Application No.: US12061969Application Date: 2008-04-03
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Publication No.: US08764993B2Publication Date: 2014-07-01
- Inventor: Atanu Saha , Salil Mohan Joshi , An-Ping Zhang
- Applicant: Atanu Saha , Salil Mohan Joshi , An-Ping Zhang
- Applicant Address: US NY Niskayuna
- Assignee: General Electric Company
- Current Assignee: General Electric Company
- Current Assignee Address: US NY Niskayuna
- Agent Jenifer Haecki
- Main IPC: C23F1/00
- IPC: C23F1/00
Abstract:
A method of making a porous SiOC membrane is provided. The method comprises disposing a SiOC layer on a porous substrate, and etching the SiOC layer to form through pores in the SiOC layer. A porous SiOC membrane having a network of pores extending through a thickness of the membrane is provided.
Public/Granted literature
- US20090252971A1 SiOC MEMBRANES AND METHODS OF MAKING THE SAME Public/Granted day:2009-10-08
Information query
