Invention Grant
US08765034B2 Pattern formation method, pattern formation apparatus, and recording medium recorded with alignment program
有权
图案形成方法,图案形成装置和记录有对准程序的记录介质
- Patent Title: Pattern formation method, pattern formation apparatus, and recording medium recorded with alignment program
- Patent Title (中): 图案形成方法,图案形成装置和记录有对准程序的记录介质
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Application No.: US13767234Application Date: 2013-02-14
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Publication No.: US08765034B2Publication Date: 2014-07-01
- Inventor: Manabu Takakuwa
- Applicant: Kabushiki Kaisha Toshiba
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Finnegan, Henderson, Farabow, Garrett & Dunner, L.L.P.
- Priority: JP2012-197807 20120907
- Main IPC: B29C59/02
- IPC: B29C59/02

Abstract:
According to one embodiment, a pattern formation method includes placing a master on a substrate including a concave-convex pattern, performing alignment between the master and the substrate, curing a photosensitive resin applied onto the substrate, with the pattern brought into contact with the resin, and removing the master from the resin. The performing alignment includes measuring amount of misalignment of first marks provided at least three of four corners of the shot region and performing alignment of the corners, after the alignment of the corners, measuring misalignment of a second mark, calculating a target value of amount of movement of the corners so as to minimize the amount of misalignment of the first marks and amount of misalignment of the second mark, and performing alignment between the master and the substrate so that the amount of movement of the corners is made close to the value.
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