Invention Grant
- Patent Title: Salt and photoresist composition containing the same
- Patent Title (中): 含有其的盐和光致抗蚀剂组合物
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Application No.: US12946243Application Date: 2010-11-15
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Publication No.: US08765351B2Publication Date: 2014-07-01
- Inventor: Koji Ichikawa , Masako Sugihara , Isao Yoshida
- Applicant: Koji Ichikawa , Masako Sugihara , Isao Yoshida
- Applicant Address: JP Tokyo
- Assignee: Sumitomo Chemical Company, Limted
- Current Assignee: Sumitomo Chemical Company, Limted
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart Kolasch & Birch, LLP
- Priority: JP2009-262884 20091118; JP2009-262885 20091118
- Main IPC: G03F7/00
- IPC: G03F7/00 ; C07C309/19

Abstract:
A salt represented by the formula (X): wherein Q1 and Q2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, L1 represents a C1-C17 divalent saturated hydrocarbon group in which one or more —CH2— can be replaced by —O— or —CO—, ring W1 represents a C4-C36 lactone ring, R3 is a C1-C6 alkyl group etc., t represents an integer of 0 to 2, Z+ represents an organic counter ion, and W10 represents a group represented by the formula (X-1): wherein L2 represents a single bond etc., ring W2 represents a C3-C36 saturated hydrocarbon ring in which one —CH2— is replaced by —CO— and in which one or more —CH2— can be replaced by —O— or —CO—, R1 represents a C1-C12 hydrocarbon group, R2 is a C1-C6 alkyl group etc., and s represents an integer of 0 to 2, or a group represented by the formula (X-2): wherein L3 represents a C1-C17 divalent saturated hydrocarbon group in which one or more —CH2— can be replaced by —O— or —CO—, ring W3 represents a C3-C36 saturated hydrocarbon ring, R4 is a hydroxyl group etc., R5 is a C1-C6 alkyl group etc., v represents an integer of 1 to 3, and w represents an integer of 0 to 2.
Public/Granted literature
- US20110117493A1 SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME Public/Granted day:2011-05-19
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