Invention Grant
- Patent Title: Methods of characterizing semiconductor light-emitting devices based on product wafer characteristics
- Patent Title (中): 基于产品晶片特性来表征半导体发光器件的方法
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Application No.: US13681994Application Date: 2012-11-20
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Publication No.: US08765493B2Publication Date: 2014-07-01
- Inventor: Andrew M. Hawryluk , David Owen
- Applicant: Andrew M. Hawryluk , David Owen
- Applicant Address: US CA San Jose
- Assignee: Ultratech, Inc.
- Current Assignee: Ultratech, Inc.
- Current Assignee Address: US CA San Jose
- Agency: Opticus IP Law PLLC
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
Methods of characterizing semiconductor light-emitting devices (LEDs) based on product wafer characteristics are disclosed. The methods include measuring at least one product wafer characteristic, such curvature or device layer stress. The method also includes establishing a relationship between the at least one characteristic and the emission wavelengths of the LED dies formed from the product wafer. The relationship allows for predicting the emission wavelength of LED structures formed in the device layer of similarly formed product wafers. This in turn can be used to characterize the product wafers and in particular the LED structures formed thereon, and to perform process control in high-volume LED manufacturing.
Public/Granted literature
- US20140141538A1 METHODS OF CHARACTERIZING SEMICONDUCTOR LIGHT-EMITTING DEVICES BASED ON PRODUCT WAFER CHARACTERISTICS Public/Granted day:2014-05-22
Information query
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