Invention Grant
US08765825B2 Method for manufacturing anion exchange resin, anion exchange resin, method for manufacturing cation exchange resin, cation exchange resin, mixed bed resin, and method for manufacturing ultrapure water for washing electronic component material
有权
阴离子交换树脂的制造方法,阴离子交换树脂,阳离子交换树脂的制造方法,阳离子交换树脂,混合床树脂,以及制造用于洗涤电子部件材料的超纯水的方法
- Patent Title: Method for manufacturing anion exchange resin, anion exchange resin, method for manufacturing cation exchange resin, cation exchange resin, mixed bed resin, and method for manufacturing ultrapure water for washing electronic component material
- Patent Title (中): 阴离子交换树脂的制造方法,阴离子交换树脂,阳离子交换树脂的制造方法,阳离子交换树脂,混合床树脂,以及制造用于洗涤电子部件材料的超纯水的方法
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Application No.: US13466663Application Date: 2012-05-08
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Publication No.: US08765825B2Publication Date: 2014-07-01
- Inventor: Takeo Fukui , Tetsuo Mizuniwa , Kazuhiko Tokunaga , Masako Yasutomi
- Applicant: Takeo Fukui , Tetsuo Mizuniwa , Kazuhiko Tokunaga , Masako Yasutomi
- Applicant Address: JP Tokyo
- Assignee: Kurita Water Industries Ltd.
- Current Assignee: Kurita Water Industries Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2007-110652 20070419; JP2007-110653 20070419; JP2007-110654 20070419
- Main IPC: B01J41/14
- IPC: B01J41/14

Abstract:
The invention relates to a method for manufacturing an anion exchange resin, wherein the method includes the step of contacting a water soluble polymer containing an anionic dissociative group with a resin to produce an anion exchange resin. In the method, an amount of contact of the water soluble polymer is 0.01 to 10 mmol/L, in terms of an amount of the anionic dissociative group, relative to 1 liter of the anion exchange resin, and a wafer surface flatness (Rms) of the anion exchange resin is 4 Å or less, determined by a silicon wafer test.
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