Invention Grant
- Patent Title: Semiconductor device with variable resistance element and method for manufacturing the same
- Patent Title (中): 具有可变电阻元件的半导体器件及其制造方法
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Application No.: US13499956Application Date: 2010-10-04
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Publication No.: US08766233B2Publication Date: 2014-07-01
- Inventor: Yukihiro Sakotsubo , Masayuki Terai , Munehiro Tada , Yuko Yabe , Yukishige Saito
- Applicant: Yukihiro Sakotsubo , Masayuki Terai , Munehiro Tada , Yuko Yabe , Yukishige Saito
- Applicant Address: JP Tokyo
- Assignee: NEC Corporation
- Current Assignee: NEC Corporation
- Current Assignee Address: JP Tokyo
- Agency: Young & Thompson
- Priority: JP2009-234810 20091009
- International Application: PCT/JP2010/067706 WO 20101004
- International Announcement: WO2011/043448 WO 20110414
- Main IPC: H01L47/00
- IPC: H01L47/00

Abstract:
A semiconductor device includes at least first and second electrodes, and a layer including a transition metal oxide layer sandwiched between the first and second electrodes. The transition metal oxide layer includes first and second transition metal oxide layers formed of different first and second transition metals, respectively. The first transition metal oxide layer is provided on the first electrode side, the second transition metal oxide layer is provided on the second electrode side, the first transition metal oxide layer and the second transition metal oxide layer are in contact with each other, the first transition metal oxide layer has an oxygen concentration gradient from the interface between the first transition metal oxide layer and the second transition metal oxide layer toward the first electrode side, and the oxygen concentration at the interface is greater than the oxygen concentration on the first electrode side.
Public/Granted literature
- US20120267598A1 SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME Public/Granted day:2012-10-25
Information query
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