Invention Grant
US08766255B2 Oxide semiconductor device including gate trench and isolation trench
有权
氧化物半导体器件包括栅极沟槽和隔离沟槽
- Patent Title: Oxide semiconductor device including gate trench and isolation trench
- Patent Title (中): 氧化物半导体器件包括栅极沟槽和隔离沟槽
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Application No.: US13418558Application Date: 2012-03-13
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Publication No.: US08766255B2Publication Date: 2014-07-01
- Inventor: Atsuo Isobe , Toshihiko Saito , Kiyoshi Kato
- Applicant: Atsuo Isobe , Toshihiko Saito , Kiyoshi Kato
- Applicant Address: JP Atsugi-shi, Kanagawa-ken
- Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee Address: JP Atsugi-shi, Kanagawa-ken
- Agency: Fish & Richardson P.C.
- Priority: JP2011-058341 20110316
- Main IPC: H01L29/786
- IPC: H01L29/786

Abstract:
A semiconductor device in which improvement of a property of holding stored data can be achieved. Further, power consumption of a semiconductor device is reduced. A transistor in which a wide-gap semiconductor material capable of sufficiently reducing the off-state current of a transistor (e.g., an oxide semiconductor material) in a channel formation region is used and which has a trench structure, i.e., a trench for a gate electrode and a trench for element isolation, is provided. The use of a semiconductor material capable of sufficiently reducing the off-state current of a transistor enables data to be held for a long time. Further, since the transistor has the trench for a gate electrode, the occurrence of a short-channel effect can be suppressed by appropriately setting the depth of the trench even when the distance between the source electrode and the drain electrode is decreased.
Public/Granted literature
- US20120235150A1 SEMICONDUCTOR DEVICE Public/Granted day:2012-09-20
Information query
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