Invention Grant
- Patent Title: Semiconductor device
- Patent Title (中): 半导体器件
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Application No.: US12665538Application Date: 2008-06-17
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Publication No.: US08766317B2Publication Date: 2014-07-01
- Inventor: Masaru Takaishi
- Applicant: Masaru Takaishi
- Applicant Address: JP Kyoto
- Assignee: Rohm Co., Ltd.
- Current Assignee: Rohm Co., Ltd.
- Current Assignee Address: JP Kyoto
- Agency: Fish & Richardson P.C.
- Priority: JP2007-160235 20070618; JP2007-160242 20070618; JP2007-160245 20070618
- International Application: PCT/JP2008/061019 WO 20080617
- International Announcement: WO2008/156070 WO 20081224
- Main IPC: H01L29/66
- IPC: H01L29/66

Abstract:
Provided is a semiconductor device in which on-resistance is largely reduced based on a new principle of operation. In the semiconductor device, if an embedded electrode is at negative potential, a depletion layer is formed from a trench to a neighboring trench so that a channel is turned off. If the embedded electrode is at a positive potential, the depletion layer is not formed in every region between the neighboring trenches so that the channel is turned on.
Public/Granted literature
- US20100193837A1 Semiconductor Device Public/Granted day:2010-08-05
Information query
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