Invention Grant
- Patent Title: Semiconductor devices having double-layered metal contacts and methods of fabricating the same
- Patent Title (中): 具有双层金属触点的半导体器件及其制造方法
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Application No.: US13615092Application Date: 2012-09-13
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Publication No.: US08766368B2Publication Date: 2014-07-01
- Inventor: Chun Soo Kang , Sang Jin Oh
- Applicant: Chun Soo Kang , Sang Jin Oh
- Applicant Address: KR Gyeonggi-do
- Assignee: SK Hynix Inc.
- Current Assignee: SK Hynix Inc.
- Current Assignee Address: KR Gyeonggi-do
- Agency: William Park & Associates Patent Ltd.
- Priority: KR10-2012-0010530 20120201
- Main IPC: H01L27/088
- IPC: H01L27/088 ; H01L21/768 ; H01L29/24

Abstract:
Semiconductor devices are provided. The semiconductor device includes a semiconductor substrate having a cell region and a peripheral region, first and second conductive line extending onto the semiconductor substrate to constitute a peripheral circuit, a first interlayer insulation layer on the first and second conductive lines, a first peripheral interconnection pattern on the first interlayer insulation layer of the peripheral region, a first contact plug disposed in the first interlayer insulation layer, second peripheral interconnection patterns on the second interlayer insulation layer of the peripheral region, a second contact plug disposed in the second interlayer insulation layer to electrically connect the first peripheral interconnection pattern to one of the second peripheral interconnection patterns, and a third contact plug penetrating the first and second interlayer insulation layers to electrically connect the second conductive line to another one of the second peripheral interconnection patterns.
Public/Granted literature
- US20130193518A1 SEMICONDUCTOR DEVICES HAVING DOUBLE-LAYERED METAL CONTACTS AND METHODS OF FABRICATING THE SAME Public/Granted day:2013-08-01
Information query
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