Invention Grant
- Patent Title: Semiconductor memory and method of manufacturing the same
- Patent Title (中): 半导体存储器及其制造方法
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Application No.: US13185930Application Date: 2011-07-19
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Publication No.: US08766373B2Publication Date: 2014-07-01
- Inventor: Masahiro Kiyotoshi , Akihito Yamamoto , Yoshio Ozawa , Fumitaka Arai , Riichiro Shirota
- Applicant: Masahiro Kiyotoshi , Akihito Yamamoto , Yoshio Ozawa , Fumitaka Arai , Riichiro Shirota
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Finnegan, Henderson, Farabow, Garrett & Dunner, LLP
- Priority: JP2006-256194 20060921
- Main IPC: H01L21/70
- IPC: H01L21/70

Abstract:
A semiconductor memory includes a plurality of stripe-like active areas formed by stacking, in a direction perpendicular to a substrate, a plurality of layers extending parallel to the substrate, a first gate electrode formed on first side surfaces of the active areas, the first side surfaces being perpendicular to the substrate, a second gate electrode formed on second side surfaces of the active areas, the second side surfaces being perpendicular to the substrate. The layers are patterned in self-alignment with each other, intersections of the active areas and the first gate electrode form a plurality of memory cells, and the plurality of memory cells in an intersecting plane share the first gate electrode.
Public/Granted literature
- US20110272745A1 SEMICONDUCTOR MEMORY AND METHOD OF MANUFACTURING THE SAME Public/Granted day:2011-11-10
Information query
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