Invention Grant
- Patent Title: MEMS device forming method and device with MEMS structure
- Patent Title (中): 具有MEMS结构的MEMS器件形成方法和器件
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Application No.: US13325320Application Date: 2011-12-14
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Publication No.: US08766380B2Publication Date: 2014-07-01
- Inventor: Michael Antoine Armand in 't Zandt , Wim van den Einden , Harold Roosen
- Applicant: Michael Antoine Armand in 't Zandt , Wim van den Einden , Harold Roosen
- Applicant Address: NL Eindhoven
- Assignee: NXP, B.V.
- Current Assignee: NXP, B.V.
- Current Assignee Address: NL Eindhoven
- Priority: EP10195471 20101216
- Main IPC: H01L27/14
- IPC: H01L27/14

Abstract:
A method of forming a MEMS device by encapsulating a MEMS element with a sacrificial layer portion deposited over a substrate arrangement, the portion defining a cavity for the MEMS element, forming at least one strip of a further sacrificial material extending outwardly from the portion, forming a cover layer portion over the sacrificial layer portion, the cover layer portion terminating on the at least one strip, removing the sacrificial layer portion and the at least one strip, the removal of the at least one strip defining at least one vent channel extending laterally underneath the cover layer portion and sealing the at least one vent channel. A device including such a packaged micro electro-mechanical structure.
Public/Granted literature
- US20120153408A1 MEMS DEVICE FORMING METHOD AND DEVICE WITH MEMS STRUCTURE Public/Granted day:2012-06-21
Information query
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