Invention Grant
- Patent Title: Field-emission electron gun and method for controlling same
- Patent Title (中): 场发射电子枪及其控制方法
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Application No.: US13577998Application Date: 2011-01-19
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Publication No.: US08766542B2Publication Date: 2014-07-01
- Inventor: Boklae Cho , Shigeru Kokubo , Hisaya Murakoshi , Hisao Nitta
- Applicant: Boklae Cho , Shigeru Kokubo , Hisaya Murakoshi , Hisao Nitta
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Technologies Corporation
- Current Assignee: Hitachi High-Technologies Corporation
- Current Assignee Address: JP Tokyo
- Agency: Mattingly & Malur, PC
- Priority: JP2010-033048 20100218
- International Application: PCT/JP2011/000233 WO 20110119
- International Announcement: WO2011/102077 WO 20110825
- Main IPC: H01J7/24
- IPC: H01J7/24

Abstract:
The disclosed charged particle beam apparatus includes a field-emission electron source including single crystal of tungsten; a vacuum chamber having the electron source therein; an exhausting system for exhausting the vacuum chamber; a filament connected to the electron source to let flow a current through the electron source and thereby heat the electron source; a power supply for letting a current flow through the filament; an ammeter for measuring a total current emitted from the electron source; and a controlling unit for exercising control to cause the power supply to let a current flow through the filament when the total current measured periodically has become a predetermined ratio or less as compared with a total current from the electron source found immediately after first electron beam emission, or a total current from the electron beam found immediately after a current is let flow through the filament.
Public/Granted literature
- US20130200788A1 FIELD-EMISSION ELECTRON GUN AND METHOD FOR CONTROLLING SAME Public/Granted day:2013-08-08
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