Invention Grant
US08767168B2 Immersion exposure apparatus and method that detects residual liquid on substrate held by substrate table after exposure
有权
浸渍曝光装置和方法，其在曝光后检测由基板台保持的基板上的残留液体
- Patent Title: Immersion exposure apparatus and method that detects residual liquid on substrate held by substrate table after exposure
- Patent Title (中): 浸渍曝光装置和方法，其在曝光后检测由基板台保持的基板上的残留液体
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Application No.: US13067842Application Date: 2011-06-29
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Publication No.: US08767168B2Publication Date: 2014-07-01
- Inventor: Hiroaki Takaiwa , Takashi Horiuchi
- Applicant: Hiroaki Takaiwa , Takashi Horiuchi
- Applicant Address: JP Tokyo
- Assignee: Nikon Corporation
- Current Assignee: Nikon Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oliff PLC
- Priority: JP2004-026864 20040203
- Main IPC: G03B27/52
- IPC: G03B27/52
Abstract:
A lithographic projection apparatus includes a substrate table configured to hold a substrate, a projection system arranged to project a patterned beam of radiation onto the substrate, a liquid supply system configured to supply liquid to a space between the projection system and the substrate, and a residual liquid detector configured to detect liquid remaining on the substrate and/or the substrate table after an exposure is completed.
Public/Granted literature
- US20110261345A1 Exposure apparatus and device manufacturing method Public/Granted day:2011-10-27
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