Invention Grant
- Patent Title: Projection optical device and exposure apparatus
- Patent Title (中): 投影光学装置和曝光装置
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Application No.: US12926159Application Date: 2010-10-28
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Publication No.: US08767172B2Publication Date: 2014-07-01
- Inventor: Akimitsu Ebihara , Martin E. Lee , Bausan Yuan
- Applicant: Akimitsu Ebihara , Martin E. Lee , Bausan Yuan
- Applicant Address: JP Tokyo
- Assignee: Nikon Corporation
- Current Assignee: Nikon Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oliff PLC
- Main IPC: G03B27/42
- IPC: G03B27/42

Abstract:
A projection optical device includes a projection optical system which projects an image of a pattern, a support member attached to the projection optical system, and a plurality of coupling members connected to the support member. The coupling members suspend and support the projection optical system through the support member from an upper direction of the support member. The projection optical device can include a frame to which one end of each of the coupling members is attached, such that the projection optical system hangs from the frame via the support member and the coupling members. A projection optical device also can include a liquid supply which supplies a temperature-controlled liquid to a side surface of a projection optical system utilizing gravity to cause the temperature-controlled liquid to flow along the side surface of the projection optical system.
Public/Granted literature
- US20110043781A1 Projection optical device and exposure apparatus Public/Granted day:2011-02-24
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