Invention Grant
- Patent Title: Optical element and projection exposure apparatus based on use of the optical element
- Patent Title (中): 基于使用光学元件的光学元件和投影曝光装置
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Application No.: US12926890Application Date: 2010-12-15
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Publication No.: US08767173B2Publication Date: 2014-07-01
- Inventor: Takeshi Shirai
- Applicant: Takeshi Shirai
- Applicant Address: JP Tokyo
- Assignee: Nikon Corporation
- Current Assignee: Nikon Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oliff PLC
- Priority: JP2002-357641 20021210
- Main IPC: G03B27/42
- IPC: G03B27/42
Abstract:
A lithographic projection apparatus projects a pattern from a patterning device onto a substrate using a projection system and includes a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid. An element of the projection system through which the pattern is projected has, on a surface configured to be in contact with the liquid, a protective coating which is substantially insoluble in the liquid.
Public/Granted literature
- US20110128514A1 Optical element and projection exposure apparatus based on use of the optical element Public/Granted day:2011-06-02
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