An optical nanolithography system and a method for optical nanolithography using a tilting transparent medium are disclosed. Initially, a pattern is exposed on a substrate at a first location by sending electromagnetic energy through the tilting transparent medium at a first angle. Then, the angle of the tilting transparent medium is changed to a second angle that is different from the first angle. Next, the pattern is exposed on the substrate at a second location by sending electromagnetic energy through the tilting transparent medium at the second angle. The second location is different from and partially overlaps with the first location. Then, the substrate is developed so that overlapping regions of the substrate exposed by the pattern at the first location and at the second location are developed differently from non-overlapping regions of the substrate exposed by the pattern only at the first location or at the second location.