Invention Grant
- Patent Title: Polarizing plate manufacturing method
- Patent Title (中): 偏光板制造方法
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Application No.: US13320306Application Date: 2010-09-07
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Publication No.: US08767295B2Publication Date: 2014-07-01
- Inventor: Ai Murakami , Takeshi Saito , Tetsurou Ikeda , Masayuki Satake
- Applicant: Ai Murakami , Takeshi Saito , Tetsurou Ikeda , Masayuki Satake
- Applicant Address: JP Ibaraki-shi
- Assignee: Nitto Denko Corporation
- Current Assignee: Nitto Denko Corporation
- Current Assignee Address: JP Ibaraki-shi
- Agency: Westerman, Hattori, Daniels & Adrian, LLP
- Priority: JP2009-208486 20090909
- International Application: PCT/JP2010/065327 WO 20100907
- International Announcement: WO2011/030757 WO 20110317
- Main IPC: G02B5/30
- IPC: G02B5/30
Abstract:
A method for manufacturing a polarizing plate comprising a polarizing film and a transparent protective film provided on at least one surface of the polarizing film, the method comprising the steps of: subjecting at least a surface of the transparent protective film to be bonded to the polarizing film to an adhesion improving treatment; bringing water into contact with at least the surface subjected to the adhesion improving treatment; and laminating the transparent protective film on the polarizing film so that the surface subjected to the adhesion improving treatment and brought into contact with water is bonded to the polarizing film.
Public/Granted literature
- US20120057230A1 POLARIZING PLATE MANUFACTURING METHOD Public/Granted day:2012-03-08
Information query
